Lithography
Suss MA/BA 8 Gen4 mask aligner
UV-LED mask aligner of the latest generation.
- Adjustable for broadband and I-Line illumination
- Equipped for 4, 6 and 8 inch wafers as well as for chip-level processing
- High accuracy motorized alignment stage for front- and backside alignment
- Soft, hard and vacuum contact and proximity lithography
Heidelberg MLA150 maskless lithography system
Heidellberg MLA 150 maskless lithography system
- Fast maskless lithography system for substrates up to 6 inch
- 375 nm LED light source
- Film thickness range from <1 μm to >500 μm with nearly vertical sidewalls
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Our spacious lithography labs are equipped with modern devices for precise microfabrication. Two seperate labs provide suitable environments for thin-film and SU-8 lithography.
Thin-film lithography lab
Thin-film laboratory
- spin coaters (up to 8 inch)
- hot plates
- hexadimethylsilazane (HDMS) priming
- quick dump rinsers (QDRs)
- Ultrasound cleaning
Wet bench with hotplates, spin coater and HMDS priming (thin-film lithography)
Wet bench with quick dump rinsing, ultrasound and spin coater for wafer cleaning and drying (thin-film lithography)
SU-8 laboratory
- spin coater
- programmable hot plates
- automatic SU-8 developer station