Lithography
Suss MA/BA 8 Gen4 mask aligner
UV-LED mask aligner of the latest generation:
- Adjustable for broadband and i-Line illumination
- Equipped for 4, 6 and 8 inch wafers as well as for chip-level processing
- High accuracy motorized alignment stage for front- and backside alignment
- Soft, hard and vacuum contact and proximity lithography
external page More information on the manufacturer's website
Heidelberg MLA150 maskless lithography system
Heidelberg MLA 150 maskless lithography system:
- Fast maskless lithography system for substrates up to 6 inch
- 375 nm LED light source
- Film thickness range from < 1 μm to > 500 μm with nearly vertical sidewalls
external page More information on the manufacturer's website
Our spacious lithography labs are equipped with modern devices for precise microfabrication. Two separate labs provide suitable environments for thin-film and SU-8 lithography.
Thin-film laboratory
Thin-film lithography lab
Equipment:
- spin coaters (up to 8 inch)
- hot plates
- hexadimethylsilazane (HDMS) priming
- quick dump rinsers (QDRs)
- Ultrasound cleaning
Wet bench with hotplates, spin coater and HMDS priming (thin-film lithography)
Wet bench with quick dump rinsing, ultrasound and spin coater for wafer cleaning and drying (thin-film lithography)
SU-8 laboratory
Equipment:
- spin coater
- programmable hot plates
- automatic SU-8 developer station