News
Direct laser writing for SU-8 lithography
Su-8 Master Mold D-BSSE Clean Room Facility
The Heidelberg MLA150 maskless lithography system gives us great flexibility in fabricating microstructures in thin and thick films (up to several 100 micron thickness). Here, 20 micron wide ridges, which serve as a mold for microfluidic chip fabrication in PDMS, have been fabricated in a 50 micron SU-8 layer.
New equipment
We will be getting a new plasma system in the next few weeks.
This is equipped with RF and microwave plasma, Oxygen, Argon, Trifluoromethane and precursor.
27.08.2024