News
Direct laser writing for SU-8 lithography
Su-8 Master Mold D-BSSE Clean Room Facility
The Heidelberg MLA150 maskless lithography system provides great flexibility for fabricating microstructures using thin and thick films (up to several 100 micron thickness). Here, 20-micron-wide ridges, which serve as a mold for microfluidic chip fabrication in PDMS, have been fabricated in a 50 micron-thick SU-8 layer.
New equipment
We received a new plasma cleaning system. It includes RF and microwave plasma and features the following gases: oxygen, argon, trifluoromethane and precursor gases.
27.08.2024