Deposition

The Ionfab 300 RIBD/RIBE is a powerful tool for thin-film deposition of metals and oxides as well as for etching a wide range of materials.

• Automatic load lock compatible with 4, 6 and 8 inch wafers
  
• Precisely controlled, homogenous deposition of Pt, TiW, ITO, Ni, Cr, Ti, TiN, Al, or TiO₂
• Reactive ion beam etching of a variety of materials including metals, glasses and silicon
• Angle and rotation of the sample holder can be varied

PECVD system for thin-film deposition on silicon and glass substrates.

• Deposition of SiO₂ and Si₃N₄ and amorphous silicon films
  
• Chamber for samples of up to 200 mm (8 inch) diameter

Cressington 108 automatic sputter coaters for the deposition of thin layers of gold or carbon on samples of up to 100 mm diameter.