Separate laboratory in the cleanroom for wet chemical processes.
Wet chemistry lab
Wet bench workstation for typical etching processes in microtechnology.
Wet bench for etching with QDR for sample rinsing
Ceramic wet bench with air washer for very special applications.
Generator and sonotrode for megasonic cleaning, 1MHz.
In addition to ultrasound and plasma cleaning options, megasound cleaning is avaliable for removal of sub-micron particles from substrates or structures. Ultrasound can destroy fine structures and is not able to remove particles smaller than 4 micrometers.
