Wet Chemistry

Separate laboratory in the cleanroom for wet chemical processes.

Wet bench workstation for typical etching processes in microtechnology.

Enlarged view: photo of Wet Bench with embeded process basins — Wet bench for etching with QDR for sample rinsing

Enlarged view: Photo of ceramic coated Wet bench with closed front glass screen — Ceramic wet bench with air washer for very special applications.

Enlarged view: photograph of a wet bench equipped with a device for megasonic cleaning — Generator and sonotrode for megasonic cleaning, 1MHz.

In addition to ultrasound and plasma cleaning options, megasound cleaning is avaliable for removal of sub-micron particles from substrates or structures. Ultrasound can destroy fine structures and is not able to remove particles smaller than 4 micrometers.

Electroplating setup for small parts.